The analysis of the charge transport mechanism of n-Si/MEH-PPV device structure using forward bias I-V-T characteristics
| dc.contributor.author | Kavasoglu, A. Sertap | |
| dc.contributor.author | Yakuphanoğlu, Fahrettin | |
| dc.contributor.author | Kavasoglu, Nese | |
| dc.contributor.author | Pakma, Osman | |
| dc.contributor.author | Birgi, Ozcan | |
| dc.contributor.author | Oktik, Sener | |
| dc.date.accessioned | 2026-08-12T17:45:56Z | |
| dc.date.issued | 2010 | |
| dc.department | Fırat Üniversitesi | |
| dc.description.abstract | In this study, temperature dependent current-voltage (I-V) measurements and investigation of the dc current transport mechanism of n-Si/MEH-PPV device have been performed. While the series resistance value displayed strongly temperature dependent behaviour, the ideality factor varied between 3.2 and 1.8 in the temperature range 110-330 K. The temperature dependent ideality factor behaviour at low temperature region (110-220K) shows that tunnelling enhanced recombination is valid rather than thermionic emission theory and the characteristic tunnelling energy is calculated as 30 meV. There is a slightly linear relationship between the ideality factor and temperature at region II (230-330 K) which is attributed to drift-diffusion current transport in the n-Si/MEH-PPV device as stated already by Osvald. (C) 2009 Elsevier B.V. All rights reserved. | |
| dc.identifier.doi | 10.1016/j.jallcom.2009.11.128 | |
| dc.identifier.endpage | 426 | |
| dc.identifier.issn | 0925-8388 | |
| dc.identifier.issn | 1873-4669 | |
| dc.identifier.issue | 1.Şub | |
| dc.identifier.orcid | 0000-0002-3098-0973 | |
| dc.identifier.scopus | 2-s2.0-76549132881 | |
| dc.identifier.scopusquality | Q1 | |
| dc.identifier.startpage | 421 | |
| dc.identifier.uri | https://doi.org/10.1016/j.jallcom.2009.11.128 | |
| dc.identifier.uri | https://hdl.handle.net/11508/60879 | |
| dc.identifier.volume | 492 | |
| dc.identifier.wos | WOS:000276018900098 | |
| dc.identifier.wosquality | Q1 | |
| dc.indekslendigikaynak | Web of Science | |
| dc.indekslendigikaynak | Scopus | |
| dc.language.iso | en | |
| dc.publisher | Elsevier Science Sa | |
| dc.relation.ispartof | Journal of Alloys and Compounds | |
| dc.relation.publicationcategory | Makale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı | |
| dc.rights | info:eu-repo/semantics/closedAccess | |
| dc.snmz | KA_WoS_20260511 | |
| dc.subject | Schottky diodes | |
| dc.subject | I-V characteristics | |
| dc.subject | Ideality factor | |
| dc.subject | Series resistance | |
| dc.subject | Barrier height | |
| dc.subject | MEH-PPV | |
| dc.subject | Heterojunction diode | |
| dc.title | The analysis of the charge transport mechanism of n-Si/MEH-PPV device structure using forward bias I-V-T characteristics | |
| dc.type | Article |







