Dopant-induced photoresponsivity in coumarin-dye-sensitized nanowire NiO/p-Si heterojunction

dc.contributor.authorSoylu, M.
dc.contributor.authorAl-Sehemi, Abdullah G.
dc.contributor.authorAbul Kalam
dc.contributor.authorAl-Ghamdi, Ahmed A.
dc.contributor.authorDere, A.
dc.contributor.authorYakuphanoğlu, Fahrettin
dc.date.accessioned2026-08-12T17:35:01Z
dc.date.issued2020
dc.departmentFırat Üniversitesi
dc.description.abstractThis article presents dopant-induced photoresponsivity in Coumarin (CO)-dye-sensitized nanowire NiO/p-Si. The photoresponse modulation of Al/CO doped NiO/p-Si/Al heterojunction relates to different configurations of NiO under light. This performance is controlled by different concentration of CO-doping based on calcination and carbon (C) incorporation of NiO. Some electronic parameters are determined (the rectification ratio RR, the engineered ideality factor n and barrier height phi(b)). CO doped NiO/p-Si photodiode can be designed as light-switchable systems with the tunable ON and OFF states. The capacitance (C)-time (s) measurements show that the heterojunction has photocapacitive behavior as a result of the doping amount of CO in NiO. Results show that we should pay more attention to the influence of CO dye on metal oxides and/or NiO for the optical switching devices and photodiode.
dc.description.sponsorshipFirat University Scientific Research Projects Unit [FF.19.29]; King Khalid University through Research Center for Advanced Materials Science at King Khalid University, Kingdom of Saudi Arabia [RCAMS/KKU/007-18]
dc.description.sponsorshipThis study was supported by Firat University Scientific Research Projects Unit under project No: FF.19.29. Also, authors would like to acknowledge the support of King Khalid University for this research through a grant RCAMS/KKU/007-18 by the Research Center for Advanced Materials Science at King Khalid University, Kingdom of Saudi Arabia.
dc.identifier.doi10.1016/j.mssp.2019.104784
dc.identifier.issn1369-8001
dc.identifier.issn1873-4081
dc.identifier.orcid0000-0002-6793-3038
dc.identifier.orcid0000-0002-5409-3770
dc.identifier.scopus2-s2.0-85073675543
dc.identifier.scopusqualityQ1
dc.identifier.urihttps://doi.org/10.1016/j.mssp.2019.104784
dc.identifier.urihttps://hdl.handle.net/11508/57372
dc.identifier.volume106
dc.identifier.wosWOS:000499708800010
dc.identifier.wosqualityQ2
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.language.isoen
dc.publisherElsevier Sci Ltd
dc.relation.ispartofMaterials Science in Semiconductor Processing
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.snmzKA_WoS_20260511
dc.subjectCoumarin
dc.subjectNiO
dc.subjectPhotoresponsivity
dc.titleDopant-induced photoresponsivity in coumarin-dye-sensitized nanowire NiO/p-Si heterojunction
dc.typeArticle

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