Characterization and performance of Schottky diode based on wide band gap semiconductor ZnO using a low-cost and simplified sol-gel spin coating technique

dc.contributor.authorFarag, A. A. M.
dc.contributor.authorFarooq, W. A.
dc.contributor.authorYakuphanoğlu, Fahrettin
dc.date.accessioned2026-08-12T17:30:45Z
dc.date.issued2011
dc.departmentFırat Üniversitesi
dc.description.abstractIn this study, a Schottky diode based on wide band gap semiconductor ZnO was fabricated on p-type Si substrate using sol-gel spin coating method. Al/ZnO/p-Si diode indicates a rectification behavior. At lower voltages, the forward current of the diode was found to obey the intrinsic thermally generated charge carriers and at relatively higher voltages, the current mechanism of the diode is controlled by a space charge limited conduction mechanism. Under reverse bias conditions, the current-voltage characteristics of the diode exhibit the lower current as compared under forward bias, indicating the existence of a current limitation mechanism induced by two field lowering mechanisms which are Poole-Frenkel and Schottky mechanisms. The parameters, series resistance R(S), the ideality factor n and the barrier height phi(B0) of the diode were determined by performing different plots obtained from the experimental forward bias current-voltage. The capacitance measurements show that the values of capacitance were almost independent of the forward bias under various frequencies. The higher values of the capacitance at low frequencies were attributed to the excess capacitance resulting from the interface states in equilibrium with the ZnO. (C) 2011 Elsevier B.V. All rights reserved.
dc.description.sponsorshipFirat University (FUBAP) [1947]; King Saud University [KSU-VPP-102]
dc.description.sponsorshipThis work was supported by the Management Unit of Scientific Research Projects of Firat University (FUBAP) (Project Number: 1947) and King Saud University under grant: KSU-VPP-102. One of the authors wishes to thank FUBAP and KSU.
dc.identifier.doi10.1016/j.mee.2011.03.016
dc.identifier.endpage2899
dc.identifier.issn0167-9317
dc.identifier.issue9
dc.identifier.orcid0000-0002-6526-5996
dc.identifier.scopus2-s2.0-80051546821
dc.identifier.scopusqualityQ2
dc.identifier.startpage2894
dc.identifier.urihttps://doi.org/10.1016/j.mee.2011.03.016
dc.identifier.urihttps://hdl.handle.net/11508/56231
dc.identifier.volume88
dc.identifier.wosWOS:000295557400013
dc.identifier.wosqualityQ2
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.language.isoen
dc.publisherElsevier Science Bv
dc.relation.ispartofMicroelectronic Engineering
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.snmzKA_WoS_20260511
dc.subjectSchottky contact
dc.subjectn-ZnO
dc.subjectBarrier height
dc.subjectSeries resistance
dc.titleCharacterization and performance of Schottky diode based on wide band gap semiconductor ZnO using a low-cost and simplified sol-gel spin coating technique
dc.typeArticle

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