On the energy distribution of interface states and their relaxation time profiles in Al/pentacene/p-GaAs heterojunction diode

dc.contributor.authorSafak, Yasemin
dc.contributor.authorSoylu, Murat
dc.contributor.authorYakuphanoğlu, Fahrettin
dc.contributor.authorAltindal, Semsettin
dc.date.accessioned2026-08-12T17:14:49Z
dc.date.issued2012
dc.departmentFırat Üniversitesi
dc.description.abstractThe energy density distribution profile of the interface states (N-ss) and their relaxation time (tau) of Al/pentacene/p-GaAs heterojunction diodes were obtained from the admittance spectroscopy method, which is included in capacitance/conductance-voltage measurements in the frequency range of 10 kHz-1 MHz at room temperature. The values of N-ss were also obtained from the forward bias current-voltage measurements by taking into account voltage-dependent barrier height, and the results were compared with those obtained using admittance method. The values of N-ss and tau obtained from admittance measurements range from 1.53 x 10(11) eV(-1) cm(-2) and 1.33 mu s in (0.596-E-v) eV to 1.90 x 10(11) eV(-1) cm(-2) and 8.18 mu s in (0.673-E-v) eV, respectively. In addition, the values of N-ss were obtained using Hill-Coleman method as a function of frequency. The values of N-ss obtained from these three methods are in the same order and in good agreement with one another. Low values of N-ss can be attributed to the interfacial pentacene layer between metal and semiconductor. This magnitude of N-ss is very suitable for the fabrication of electronic devices. The C values of these diodes decrease with increasing frequency both in inversion and depletion regions, but give a peak in the accumulation region due to the effect of series resistance. The increase in C, especially at low frequencies, results from the presence of interface states at GaAs/pentacene interface. (C) 2012 American Institute of Physics. [doi:10.1063/1.3681371]
dc.description.sponsorshipGazi University (BAP) [FF. 05/2011-19]
dc.description.sponsorshipThis work was supported by Gazi University Scientific Research Project (BAP), FF. 05/2011-19.
dc.identifier.doi10.1063/1.3681371
dc.identifier.issn0021-8979
dc.identifier.issn1089-7550
dc.identifier.issue3
dc.identifier.orcid0000-0002-7718-2856
dc.identifier.scopus2-s2.0-84857407232
dc.identifier.scopusqualityQ1
dc.identifier.urihttps://doi.org/10.1063/1.3681371
dc.identifier.urihttps://hdl.handle.net/11508/51960
dc.identifier.volume111
dc.identifier.wosWOS:000301029800117
dc.identifier.wosqualityQ3
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.language.isoen
dc.publisherAmer Inst Physics
dc.relation.ispartofJournal of Applied Physics
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.snmzKA_WoS_20260511
dc.subjectCapacitance-Frequency Characteristics
dc.subjectElectrical Characterization
dc.subjectSi-Sio2 Interface
dc.subjectC-V
dc.subjectConductance
dc.titleOn the energy distribution of interface states and their relaxation time profiles in Al/pentacene/p-GaAs heterojunction diode
dc.typeArticle

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